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  Publications

 

  1. Wang, P.; Moorefield, C. N.; Newkome, G. R., “Synthesis, X-ray Structure, and Self-Assembly of Functionalized Bis(2,2’:6’,2”-terpyridinyl)arenas,” Org. Lett., 2004, in press.
  2. Kim, H.; Foster, M.D.; Tullis, S.; Jiang, H.; Bunning, T.; Majkrzak, C. F., "Interface Structure of Photonic Multilayers Prepared by Plasma Enhanced Chemical Vapor Deposition," Polymer, 45 (10), 3175-3184 (2004). doi: 10.1016/ j.polymer. 2004.03.028.
  3. Meng, S.; Nanjundiah, K.; Kyu, T.; Bunning, T. J.; Natarajan, L.; Tondiglia, V., “Transport Controlled Pattern Photo-polymerization in a Single Component System,” submitted to Macromolecules.
  4. Chen, D.; Mattice, W. L., “A Monte Carlo Simulation of Coarse-Grained Poly(silylenemethylene) and Poly(dimethylsilylenemethylene) Melts,” Polymer, revision January 16, 2004.
  5. Hartschuh, R.;  Ding, Y.;  Roh, J. H.; Kisliuk, A.; Sokolov, A. P.; Soles, C. L.; Wu, W.-L.; Mahorowala, A. P., "Brillouin Scattering Studies of Polymeric Nanostructures," J. Polym. Sci. B, 42, 1106-1113 (2004).
  6. Helfer, C. A.; Mattice W. L.; Chen D., “Substituted Poly(silylenemethylene)s with Short Range Interactions that Induce a Preference for the Same Local Conformation in Unperturbed Atactic, Isotactic, and Syndiotactic Chains,”  Polymer, 45, 1297-1306 (2004).
  7. Lyuksyutov, S. F.; Vaia, R. A.; Paramonov, P. B.; Juhl, S., “Amplitude-modulated electrostatic nanolithography in polymers based on atomic force microscopy,” Applied Physics Letters, 83 (21), 4405-4407 (2003).
  8. Lyuksyutov, S. F.; Vaia, R. A.; Paramonov, P. B.; Juhl, S.; Waterhouse, L.; Ralich, R.M.; Sigalov, G.; Sancaktar, E., “Electrostatic Nanolithography in Polymers Using Atomic Force Microscopy,” Nature Materials, 2(7) 468-472 (2003).
  9. Yang, J.; Dai, L.; Vaia, R. A., “Multicomponent Interposed Carbon Nanotube Micropatterns by Region-Specific Contact Transfer and Self-Assembling,” J. Phys. Chem. B, 107, 12387-12390 (2003).
  10. Dai, L.; Patil, A.; Vaia, R. A., “Surface Modification of Aligned Carbon Nanotubes,” in ‘Electronic Properties of Novel Materials’, AIP Conference Proceeding, Kuzmany, H.; Fink, J.; Mehring, M.; Roth, S.  (Eds.), American Institute Physics:  New York, 2003, pp. 621-634.
  11. Kyu, T., “Effect of CNT Alignment on Nematic Isotropic Transition of Liquid Crystals,” in preparation.
  12. Yang, J.; Dai, L.; Vaia, R. A., “Region-Specific Self-Assembling of Silica Nanoparticles within Aligned Carbon Nanotube Micropatterns,” in preparation.
  13. Helfer, C. A.; Chen, D.; Mattice, W. L., “Conformations Produced by Interaction of the Side Chains in the Poly(silylenemethylene) with Repeating Sequence [Si(CH3)R-CH2]x, R = -O(CH2)3OC6H4C6H5,” in preparation.

 

  Presentations

 

  1. Patil, A.; Vaia, R.; Dai, L. “Surface Modification of Aligned Carbon Nanotube Arrays for Electron Emitting Applications,” to be presented at The International Conference on Synthetic Metals (ICSM 2004) being held in Wollongong, Australia, June 28 – July 2, 2004.
  2. Meng, S.; Nanjundiah, K.; Kyu, T.; Bunning, T. J.; Natarajan, L.; Tondiglia, V., “Transport Controlled Pattern Photo-polymerization in a Single Component System,” APS March Meeting, Austin, TX, 2003.
  3. Duran, H.; Nanjundiah, K.; Dai, L.; Kyu, T.; Bunning, T.J.; Natarajan, L.; Tondiglia, V., “Pattern-Photopolymerization-Induced Phase Separation of Self Assembled Carbon Nanotube Composites,” APS March Meeting, Austin, TX, 2003.
  4. Lyuksyutov, S. F.; Paramonov, P. B.; Sigalov, G.; Vaia, R. A.;  Juhl, S.; Sancaktar, E., “Electrostatic Nanolithography in Polymer Materials: An Alternative Technique For Nanostructure Formation,” OS/APS & OS/AAPT, Cleveland, OH, 2003.
  5. Lyuksyutov, S. F.; Deneen, R. W.; Paramonov, P. B.; Sigalov, G.; Juhl, S.; Vaia, R. A., “Humidity Factor in AFM-Assisted Nanolithography in Mono- and Bi-Layer Polymer Films,” OS/APS &OS/AAPT, Cleveland, OH, 2003.
  6. Lyuksyutov, S. F.; Sancaktar, E.; Paramonov, P. B.; Kim, J., “A Novel Method of SPM-Based Nanolithography in Polyethylene-Terephthalate Polymer Films,” Material Science and Technology Conference (IV International Symposium of Surface Modification), FL, 2003.
  7. Helfer, C. A.; Chen, D.; Mattice, W. L., “Use of a High Coordination Lattice to Investigate Side Chain Liquid Crystalline Polymers,” Molecular Modeling of Macromolecules Workshop, Hilton Head, SC, 2004.
  8. Newkome, G. R.; Cho, T.-J.; Wang, P., “Metallodendrimers: Fractals and Photonics,” Symposium on Metal-Containing and Metallo-Supramolecular Polymers and Materials, 227th ACS National Meeting, Anaheim, CA, 2004.
  9. Mehtani, D.; Lee, N. H.; Hartschuh,  R.; Kisliuk, A.; Duda, M.; Sokolov,  A.; Foster, M.;  Maguire, J., "Developing Scanning Nano-Raman Spectroscopy," APS March Meeting, Montreal, Canada, 2004.
  10. Hartschuh, R.; Ding, Y.; Roh, J. H.; Kilsiuk, A.; Sokolov, A.; Soles, C.; Jones, R. L.; Hu, T. J.; Wu, W. L.; Mahorowala, A. P., "Mechanical Properties of Polymeric Nanostructures via Brillouin Light Scattering," APS March Meeting, Montreal, Canada, 2004.

  

  Patents

 

  1. Lyuksyutov, S. F.; Vaia, R. A.; Juhl, S., "The Method of Polymer Nanolithography," Patent 60/540,903 (U.S.provisional number).

 

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