Nanolithography in Polymeric Photonic Materials

Dr. Sergei Lyuksyutov, UA, in collaboration with Dr. Rich Vaia, AFRL 

Dr. Sergei F. Lyuksyutov

The University of Akron

Department of Physics

Akron, OH  44325-4001

Voice:  (330) 972-8356

Fax:  (330) 972-6918

Email:  sfl@physics.uakron.edu

Web Page:  Dr. Sergei Lyuksyutov

Project Description

The utilization of AFM-assisted electrostatic nanolithography (AFMEN), which is an alternative lithography technique that generates features by mass transport of polymer within an initially uniform, planar film in the preparation of photonic devices, is being explored.  The process takes place without chemical cross-linking, substantial polymer degradation or ablation.  The combination of localized softening of attoliters (10²-10⁵ nm³) of polymer by Joule heating, extremely non-uniform electric field gradients to polarize and manipulate the softened polymer, and single-step process methodology using conventional AFM equipment, has established a new paradigm for polymer nanolithography.  This technique allows rapid (order of microseconds) creation of raised (or depressed) features without external heating or AFM tip contact. Advantageously, the method of the present invention has utility in a wide variety of applications such as enabling the exploration of materials at the atomic and molecular levels and providing the ability to sculpt and assemble structures on the nanoscale.  Nano-structuring of polymers is crucial to many aspects of future material fabrication because of the emerging predominance of polymers in commercial and military applications such as molecular electronics, data storage, optoelectronics, displays, and sensors.

Accomplishments

This alternative lithography technique utilizes a controlled bias through the thin polymer film (20-100 nm thickness) between the highly conductive cantilever tip and the conductive wafer underneath that softens the polymer material directly under the AFM tip through localized Joule heating.  Due to the advantages of this invention that the features are formed without chemical cross-linking, substantial polymer degradation, or ablation, a patent has been filed.¹

Group Members in Collaboration

Mr. Robert M. Ralich  (graduate student)

Mr. Richard W. Deneen (graduate student) 

¹Patent 60/540,903 (U.S.provisional number) "The Method of Polymer Nanolithography," S.F. Lyuksyutov, R.A. Vaia, and S. Juhl.